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Horizontal
LPE Quartz Tube
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5
Heating Zones
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Constant
Temperature Flat-Zone: 550 mm
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Temperatures
up to 1050 °C
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Regulation
Accuracy: ± 0,5 °C
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High
Homogeneity of Layer-Thickness
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Fully
automatic Computer-Controlled Processing
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Data-Logging
of all Process-Parameters
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Suitable
for Multi-Layer Epitaxial Processes
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Suitable
for Wafer Diameter up to 3”
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Flexible
Adaptation of Wafer-Capacity