H2 Gas Purifier - Specifications

equipment  furnace oven lpe diffusion lcd pdp fpd glass flat panel h2 hydrogen gas

Type

HCPS-60

HCPS-300

Maximum Flow Rate

60 slm

300 slm

Maximum Operating Pressure

700psig

700psig

Minimum Operating Pressure

30 psig

30 psig

Purifying Media

Nickel Silica Mix

Nickel Silica Mix

Gases Removed from H2

CO, CO2, H2O, O2, NMHC’s

CO, CO2, H2O, O2, NMHC’s

Outlet Purity

<1 ppb (eq. 9N)

<1 ppb (eq. 9N)

Operation Temperature

 0°C to 50°C 
(32
° F to 122° F)

 0°C to 50°C 
(32
° F to 122° F)

Inlet/outlet Connections

¼” male VCR

½” male VCR

Leak Rating

4 X 10-9 atm cc/sec

4 X 10-9 atm cc/sec

SOF Optoelectronics GmbH, Gartenstr. 38, 52249 Eschweiler, Germany
Tel +49 (0)2403 519 333 , Fax +49 (0)2403 508 968 , eMail: info@sof-e.com , Web: www.sof-e.com